二氧化硅抛光悬浮液
Used for final polishing, mixtures of abrasive particles dispersed throughout a chemically aggressive liquid carrier. It provides a chemical-mechanical polishing action, resulting in deformation-free surfaces.
CMP-300 Silica Suspension
This non-crystallizing silica suspension with 9.8 pH produces an excellent final polish for a wide variety of materials, especially nonferrous metals, PCBs and ICs.
Grit(um) | Pack | Code |
0.05 | 500 ml | 04-450500 |
0.05 | 1000 ml | 04-451000 |
0.05 | 5000 ml | 04-455000 |
CMP-400 Silica Suspension
This non-crystallizing silica suspension with 10.2 pH produces an excellent final polish.
Especially for Titanium, iron, steel.
Grit(um) | Pack | Code |
0.05 | 500 ml | 04-460500 |
0.05 | 1000 ml | 04-461000 |
0.05 | 5000 ml | 04-465000 |